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  <titleInfo>
    <title>Standard methods of chemical analysis</title>
    <subTitle>instrumental methods</subTitle>
  </titleInfo>
  <name type="personal">
    <namePart>Campbell, Lavernus</namePart>
    <role>
      <roleTerm type="text">editor.</roleTerm>
    </role>
  </name>
  <name type="personal">
    <namePart>Turner, William</namePart>
    <role>
      <roleTerm type="text">editor.</roleTerm>
    </role>
  </name>
  <typeOfResource>text</typeOfResource>
  <genre authority="marc">bibliography</genre>
  <originInfo>
    <place>
      <placeTerm type="code" authority="marccountry">nyu</placeTerm>
    </place>
    <dateIssued encoding="marc">2015</dateIssued>
    <issuance>monographic</issuance>
  </originInfo>
  <language>
    <languageTerm authority="iso639-2b" type="code">eng</languageTerm>
  </language>
  <physicalDescription>
    <form authority="marcform">print</form>
    <extent>xiii, 250 pages : illustrations ; 24 cm.</extent>
  </physicalDescription>
  <tableOfContents>Preliminary application of combinatorial measurement and regression analysis method to high precision instrumental analysis -- Surface analytical approaches contributing to quality assurance during manufacture of functional interfaces -- Trace determination of cadmium in water using anodic stripping voltammetry at a carbon paste electrode modified with coconut shell powder -- Chemical and instrumental characterization of pectin from dried pomace of eleven apple cultivars -- Large-scale synthesis of highly emissive and photostable cuins2/zns nanocrystals through hybrid flow reactor -- The effects of instrument parameters and sample properties on thermal decomposition: interpreting thermal analysis data from mars -- Induced ph-dependent shift by local surface plasmon resonance in functionalized gold nanorods -- Kinetic modeling: a predictive tool for the adsorption of zinc ions onto calcium alginate beads -- Combination of lithography and coating methods for surface wetting control -- Three-dimensional lithography using combination of nanoscale processing and wet chemical etching -- Fabrication of 3D and nano-structures by prism-assisted uv and holographic lithography.</tableOfContents>
  <note type="statement of responsibility">edited by Lavernus Campbell and William Turner.</note>
  <note>Includes index.</note>
  <subject authority="lcsh">
    <topic>Analytical chemistry</topic>
  </subject>
  <subject>
    <topic>Chemistry, Analytic</topic>
  </subject>
  <classification authority="lcc">QD131</classification>
  <classification authority="ddc">543 St242</classification>
  <identifier type="isbn">9781680943412</identifier>
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    <recordCreationDate encoding="marc">250820</recordCreationDate>
    <recordChangeDate encoding="iso8601">20250820155006.0</recordChangeDate>
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